Thickness determination of thin and ultrathin SiO2 films by C-AFM IV spectroscopy
Frammelsberger, W. , Benstetter, G. , Kiely, J. and Stamp, R. (2005) Thickness determination of thin and ultrathin SiO2 films by C-AFM IV spectroscopy. Applied Surface Science, 252 (6). pp. 2375-2388. ISSN 01694332
Full text not available from this repository
Publisher's URL: http:\\dx.doi.org\10.1016/j.apsusc.2005.04.010
Results from a European collaborative project involving UWE, University of Applied Science, Deggendorf and Infineon Technologies are described. The method illustrates clearly for the first time the differences between ellipsometry and AFM measurements of thin oxide films. The novel techniques described have been incorporated into practical reliability testing processes at Infineon Technologies, Munich (Thomas Schweinbock).
Repository Staff Only: item control page