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Frammelsberger, W., Benstetter, G., Stamp, R., Kiely, J. and Schweinboeck, T. (2005) Simplified tunnelling calculations for MOS structures with ultra thin oxides for conductive atomic force microscopy measurements. Materials Science and Engineering B, 116 (2). pp. 168-174. ISSN 0921-5107 Available from: http://eprints.uwe.ac.uk/5955
Frammelsberger, W., Benstetter, G., Kiely, J. and Stamp, R. (2005) Thickness determination of thin and ultrathin SiO2 films by C-AFM IV spectroscopy. Applied Surface Science, 252 (6). pp. 2375-2388. ISSN 01694332 Available from: http://eprints.uwe.ac.uk/5956
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